Author:
Dran J.C.,Langevin Y.,Maurette M.,Petit J.C.
Abstract
ABSTRACTNew results on the etchability of lead implanted silicate glasses are presented which are satisfactorily accounted for by a Monte Carlo Model of etching. These results strongly support the radiation damage origin of the ion-induced modification of the chemical reactivity of glass. Major artefacts of ion implantation are then discarded as possible causes of the observed effects and consequently this technique is shown to be a valuable tool for the study of α-recoil aging in H.L.W. glasses.
Publisher
Springer Science and Business Media LLC
Cited by
2 articles.
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