Direct Surface Analysis of Organic Contamination for Semiconductor Related Materials

Abstract

ABSTRACTDirect surface analysis of Si wafers and environmental materials such as polymers for wafer carriers and for high purity water systems is important to identify contaminants and their sources. Organic contaminants on the surfaces are difficult to analyze; however, their adverse effects have been cited in recent years. This paper demonstrates the detection and identification of surface contaminants using Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) on semiconductor related materials. The analytical information provided by TOF-SIMS can be useful for maintaining material cleanliness or for failure analysis.