Abstract
ABSTRACTSignificant progress has been made in HgCdTe MBE technology over the last two years. Device quality materials have been grown with the alloy compositions required for short-wavelength infrared (SWIR), 1-3 micron to LWIR (long-wavelength infrared), 8-12 micron applications. Indeed, the observation of low defect density (EPD<2×105/cm2), long minority carrier lifetime and efficient IR photoluminescence attests to the device quality of HgCdTe epilayers grown by MBE. In addition, the breakthroughs to achieve In (N-type) and As (P-type) doping in situ have provided greater flexibilities for fabricating advanced heterojunction devices. High performance IR imaging arrays have been fabricated and IR images were obtained. Also, dual-band detectors and injection infrared diode lasers which have been demonstrated recently are considered. Finally, additional developments and the future challenges in HgCdTe MBE technology are discussed.
Publisher
Springer Science and Business Media LLC
Cited by
5 articles.
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1. Narrow Bandgap II-VI Semiconductors: Growth;Springer Handbook of Electronic and Photonic Materials;2017
2. Narrow-Bandgap II–VI Semiconductors: Growth;Springer Handbook of Electronic and Photonic Materials;2006
3. MBE-grown HgCdTe multi-layer heterojunction structures for high speed low-noise 1.3–1.6 µm avalanche photodetectors;Journal of Electronic Materials;1997-06
4. Molecular beam epitaxy of HgCdTe;Narrow-gap II–VI Compounds for Optoelectronic and Electromagnetic Applications;1997
5. Molecular beam epitaxial growth and properties of short-wave infrared Hg0.3Cd0.7Te films;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1996-05