Author:
Tan Z.,Budnick J. I.,Sanchez F.,Tourillon G.,Namavar F.,Hayden H.,Fasihuddin A. F.
Abstract
AbstractThe early stages of cobalt silicide formation in high dose (1.0 to 8.0× 1017Co/cm2) cobalt implanted Si(100) are studied by extended X-ray absorption fine structure (EXAFS), X-ray diffraction (XRD) and Rutherford backscattering spectroscopy (RBS). Locally ordered silicide that is not detectable in XRD has been observed with EXAFS in the as-implanted samples. Long-range ordered phases are observed in the 3 × 1017Co/cm2 samples. After thermal annealing at 700–750°C, single phase CoSi2 with (400) orientation is formed in all implants.
Publisher
Springer Science and Business Media LLC