Microstructruture of Heteroepitaxially Grown TiO2 Films by Magnetron Sputtering

Abstract

ABSTRACTTitanium dioxide (TiO2) films were deposited on (a) non-alkali glass, (b) MgO (100) and (c) SrTiO3 (100) single crystals by rf reactive magnetron sputtering using a Ti metal target. X-ray diffraction and a pole figure analysis revealed that TiO2 films on the (a) were anatase polycrystals with <101> preferred orientation, whereas heteroepitaxial growth of anatase TiO2 was observed on the (b) and the (c) substrates. FE-SEM analyses on the crystal habit of the firm surfaces showed that the substrate temperature during the deposition (Ts) heavily affected the microstructure and surface morphology of the heteroepitaxially grown films, which could be clearly explained in terms of “Thornton's zone model” or “epitaxial growth model of 2-dimensional ledge or kink modes” considering the normalized Ts by the phase transition temperature from anatase to rutile.