Organometallic Vapor Phase Epitaxial Growth of ZnGeAs2 and (ZnGeAs2)xGe1−x on GaAs

Abstract

ABSTRACTEpitaxial single crystal (001) chalcopyrite-structure ZnGeAs2 and single crystal (100) zinc blende-structure (ZnGeAs2)xGe1−x alloys have been grown by organometallic vapor phase epitaxy on (100) GaAs. Selected area electron diffraction was used to determine the crystal structure for several Zn:Ge molar flow ratios. Bulk chemical composition was determined by electron microprobe and correlated to crystal lattice constants obtained from x-ray diffraction. Due to the lattice mismatch between chalcopyrite-structure ZnGeAs2 and the GaAs substrate, the epitaxy is elastically strained, compressing the a-lattice constant and elongating the c-lattice constant. Optical absorption and transmission spectroscopy indicate the zinc-blende-structure material has an indirect band gap of approximately 0.6 eV, whereas the chalcopyrite ZnGeAs2 has a direct band gap of 1.15 eV. Secondary ion mass spectroscopy reveals significant Zn diffusion into the GaAs substrate if the Zn:Ge molar flow ratio exceeds the ratio required for stoichiometric chalcopyrite-structure crystal growth.