Author:
Depuydt J.M.,Cheng H.,Haase M.A.,Potts J.E.
Abstract
Recently, with the advent of thermal nonequilibrium growth techniques like molecular beam epitaxy and metalorganic chemical vapor deposition, great progress has been made in overcoming some of the problems traditionally encountered in the growth and doping of ZnSe. Breakthroughs have been made in several areas including the growth of high quality undoped films, in intentional n-type doping and, most importantly, in p-type doping. In this paper we will review the progress made in the growth and doping of ZnSe by molecular beam epitaxy.
Publisher
Springer Science and Business Media LLC
Cited by
3 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献