Enhancing Photocatalytic Activity of ZnO Nanoparticles in a Circulating Fluidized Bed with Plasma Jets

Author:

Ma Shiwei,Huang Yunyun,Hong RuoyuORCID,Lu Xuesong,Li Jianhua,Zheng Ying

Abstract

In this work, zinc oxide (ZnO) nanoparticles were modified in a circulating fluidized bed through argon and hydrogen (Ar–H) alternating-current (AC) arc plasma, which shows the characteristics of nonequilibrium and equilibrium plasma at the same time. In addition, a circulating fluidized bed with two plasma jets was used for cyclic processing. The catalytic degradation performance on Rhodamine B (Rh B) by Ar–H plasma-modified ZnO and pure ZnO was tested in aqueous media to identify the significant role of hydrogen atoms in Rh B degradation mechanism. Meanwhile, the effects of plasma treatment time on the morphology, size and photocatalytic performance of ZnO were also investigated. The results demonstrated that ZnO after 120-min treatment by Ar–H plasma showed Rh B photocatalytic degradation rate of 20 times greater than that of pure ZnO and the reaction follows a first kinetics for the Rh B degradation process. Furthermore, the photocatalyst cycle experiment curve exhibited that the modified ZnO still displays optimum photocatalytic activity after five cycles of experiment. The improvement of photocatalytic activity and luminescence performance attributes to the significant increase in the surface area, and the introduction of hydrogen atoms on the surface also could enhance the time of carrier existence where the hydrogen atoms act as shallow donors.

Funder

National Natural Science Foundation of China

Publisher

MDPI AG

Subject

Physical and Theoretical Chemistry,Catalysis

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3