Abstract
The description of a new method of winter grafting of sweet cherry varieties “Revna” is given. The novelty of the method lies in the use of a portable device for generating cold plasma, as well as a plasma-treated solution, developed by the team of authors. It has been established that exposure to cold plasma affects the growth length of “Revna” cherries by 17–28%, while an increase in the diameter of the root collar by 20–23% was observed. The electrical resistivity in the grafting zone after exposure to plasma or plasma-activated water decreased by an average of 14% compared to the control, which indicated a better fusion of the transport fibers of the rootstocks and scions.
Funder
Ministry of Science and Higher Education of the Russian Federation
Subject
Fluid Flow and Transfer Processes,Computer Science Applications,Process Chemistry and Technology,General Engineering,Instrumentation,General Materials Science
Cited by
8 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献