High-Bonding-Strength Polyimide Films Achieved via Thermal Management and Surface Activation

Author:

He Pin-Syuan12,Tran Dinh-Phuc12,Kuo Ting-Yu12,Hsu Wei-You12,Lin Huai-En12,Shie Kai-Cheng12,Chen Chih12ORCID

Affiliation:

1. Department of Materials Science and Engineering, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan

2. Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu 30010, Taiwan

Abstract

In this study, thermal and argon (Ar) plasma/wetting treatments were combined to enhance the bonding strength of polyimide (PI) films. Attenuated total reflectance-Fourier transform infrared spectroscopy (ATR-FTIR) was used to analyze the changes in the PI imidization degrees. The contact angles of the PI films were also measured. The results show that the contact angles of the fully cured PI films markedly decreased from 78.54° to 26.05° after the Ar plasma treatments. X-ray photoelectron spectroscopy (XPS) analysis was also conducted on the PI surfaces. We found that the intensities of the C-OH and C-N-H bonds increased from 0% to 13% and 29% to 57%, respectively, after Ar plasma activation. Such increases in the C-OH and C-N-H intensities could be attributed to the generation of dangling bonds and the breakage of the imide ring or polymer long chains. Shear tests were also conducted to characterize the bonding strength of the PI films, which, after being treated with the appropriate parameters of temperature, plasma power, and wetting droplets, was found to be excellent at greater than 35.3 MPa.

Publisher

MDPI AG

Subject

General Materials Science,General Chemical Engineering

Reference33 articles.

1. Enquist, P., Fountain, G., Petteway, C., Hollingsworth, A., and Grady, H. (2009, January 28–30). Low Cost of Ownership scalable copper Direct Bond Interconnect 3D IC technology for three dimensional integrated circuit applications. Proceedings of the IEEE International Conference on 3D System Integration, San Francisco, CA, USA.

2. Gambino, J., Winzenread, R., Thomas, K., Muller, R., Truong, H., Defibaugh, D., Price, D., Goshima, K., Hirano, T., and Watanabe, Y. (2017, January 16–18). Reliability of hybrid bond interconnects. Proceedings of the IEEE International Interconnect Technology Conference (IITC), Hsinchu, Taiwan.

3. Beyne, E., Kim, S.-W., Peng, L., Heylen, N., De Messemaeker, J., Okudur, O.O., Phommahaxay, A., Kim, T.-G., Stucchi, M., and Velenis, D. (2017, January 2–6). Scalable, sub 2 μm pitch, Cu/SiCN to Cu/SiCN hybrid wafer-to-wafer bonding technology. Proceedings of the IEEE International Electron Devices Meeting (IEDM), San Francisco, CA, USA.

4. Sukegawa, S., Umebayashi, T., Nakajima, T., Kawanobe, H., Koseki, K., Hirota, I., Haruta, T., Kasai, M., Fukumoto, K., and Wakano, T. (2013, January 17–21). A 1/4-inch 8Mpixel back-illuminated stacked CMOS image sensor. Proceedings of the IEEE International Solid-State Circuits Conference Digest of Technical Papers, San Francisco, CA, USA.

5. Yoneda, S., Adachi, K., Kobayashi, K., Matsukawa, D., Sasaki, M., Itabashi, T., Shirasaka, T., and Shibata, T. (July, January 1). A Novel Photosensitive Polyimide Adhesive Material for Hybrid Bonding Processing. Proceedings of the IEEE 71st Electronic Components and Technology Conference (ECTC), San Diego, CA, USA.

Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Low Contact Resistance and Low Temperature Hybrid Bonding with Polyimide and Highly <111>-oriented Nanotwinned Cu;2023 18th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT);2023-10-25

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3