Optical Study on Temperature-Dependent Absorption Edge of γ-InSe-Layered Semiconductor

Author:

Wu Wen-Te1,Tiong Kwong-Kau1,Tan Shih-Wei1,Hu Sheng-Yao2,Lee Yueh-Chien3ORCID,Chen Ruei-San4,Wu Chia-Ti5

Affiliation:

1. Department of Electrical Engineering, National Taiwan Ocean University, Keelung 202, Taiwan

2. Department of Electrical Engineering, Lunghwa University of Science and Technology, Guishan, Taoyuan 333, Taiwan

3. Department of Electronic Engineering, Lunghwa University of Science and Technology, Guishan, Taoyuan 333, Taiwan

4. Graduate Institute of Applied Science and Technology, National Taiwan University of Science and Technology, Taipei 106, Taiwan

5. Department of Telecommunication Engineering, National Kaohsiung University of Science and Technology, Kaohsiung 811, Taiwan

Abstract

We have studied the variations in the temperature-dependent absorption edge of a bulk InSe-layered semiconductor using photoconductivity (PC) measurements. From both the X-ray diffraction (XRD) and Raman experimental results, the structural phase of the as-prepared InSe sample was confirmed to be γ-polytype. Upon heating from 15 K to 300 K, the absorption edge of PC spectra was found to shift significantly toward lower energy, and the absorption edge as a function of temperature was further analyzed by the Varshni’s relationship and Bose–Einstein empirical equation. The Urbach energy as a function of temperature was obtained by fitting the absorption tail below the absorption coefficient of the PC spectrum, and the effective phonon energy can be derived from the temperature-dependent steepness parameter associated with Urbach energy. Our study indicates that the broadening of the absorption edge in the as-synthesized bulk γ-InSe is caused by a combination of electron/exciton–phonon interactions and thermal/structural disorder.

Funder

National Science Council Project

Publisher

MDPI AG

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