Dental Resin-Zirconia Bonding Promotion Using High-Silica PVD Coating with High Ionization Sputtering Processing

Author:

Abdalla Mohamed,Lung Christie,Tsoi James,Matinlinna Jukka

Abstract

Purpose: To evaluate the effect of high-silica coating deposited by high-silica physical vapor deposition (PVD) as a chemical bonding method on resin-zirconia bond strength under different aging conditions. Methods: Twelve Y-TZP blocks were used as the substrates. Four resin cement stubs were bonded on each Y-TZP block, with a total number of 48 resin cement stubs. Two test groups (n = 24) were evaluated: conventional Tribochemical silica-coating (TSC) and high-silica PVD with high ionization sputtering processing. Experimental silane primer (MPS) was brushed over the surface treated Y-TZP blocks, then a polyethylene mold was placed over the coated Y-TZP blocks and filled with the adhesive resin cement, then light-cured for 40 s. The shear bond strength (SBS) was then evaluated in dry condition and after thermo-cycling for 6000 cycles. Surface roughness, mode of failure, surface topography and elemental analysis were also evaluated. Results: In dry condition, PVD-coated zirconia specimens showed significantly higher mean SBS values (11.7 ± 1.3 MPa) compared to TSC (10.2 ± 1.1 MPa) (p = 0.027). The SBS values of TSC and PVD-coated samples after thermo-cycling were higher than in dry condition, but with no statistical significant difference (p > 0.05). Tetragonal-to-monoclinic phase transformation was detected in TSC, but not in PVD-coated zirconia. Significant decrease in surface roughness of PVD samples compared to TSC samples (p < 0.001). The silica content in PVD coating was 51% as detected by EDX. Conclusions: High-silica PVD coating on zirconia can give a reliable resin-zirconia chemical bond without any phase transformation and surface destruction by conventional grit-blasting.

Publisher

MDPI AG

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces

Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3