Advances and Challenges in Pulsed Laser Deposition for Complex Material Applications

Author:

Duta Liviu1ORCID,Mihailescu Ion N.1ORCID

Affiliation:

1. National Institute for Lasers, Plasma and Radiation Physics, 077125 Magurele, Romania

Abstract

Various physical vapor deposition (PVD) techniques, such as molecular beam epitaxy, electron beam physical vapor deposition, pulsed laser deposition (PLD), arc discharge, magnetron sputtering and/or ion beam sputtering, are currently used for coating or growing thin films on solid substrates [...]

Publisher

MDPI AG

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces

Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Fabrication and analysis of zirconium thin films on silicon (Si) by pulsed laser deposition;Nanoscale and Quantum Materials: From Synthesis and Laser Processing to Applications 2024;2024-03-12

2. Toxicity of 2D Materials and Their Future Prospect;Toxicity of Nanoparticles - Recent Advances and New Perspectives;2024-01-10

3. Synthesis and Characterization of a Zirconium (Zr) Thin Film on Si(100) via Pulsed Laser Deposition;Coatings;2023-10-10

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