Abstract
The effects of plasma treatment of polyimide substrates on the texture and grain size distribution of aluminum thin films were studied. Oxygen-argon plasma treatment increased the average grain size and enhanced the (111) film texture. For short oxygen-argon plasma treatment times, the deposited Al films showed a (111) texture with a bimodal grain structure and even a {111}<112¯> type in-plane texture. The preferential nucleation and grain growth of (111) grains are discussed in terms of the interface energy anisotropy.
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces
Cited by
3 articles.
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