Paramagnetic Properties of Carbon Films

Abstract

This research paper presents the results of obtaining carbon films on various substrates (quartz, mica, and silicon) at temperatures from 0 °C (initial) to 800 °C through plasma chemical vapor deposition. The carbon films obtained on various films were studied using the method of electron paramagnetic resonance (EPR). EPR measurements were carried out on twenty samples at a perpendicular and parallel arrangement of the sample plane concerning the orientation of the magnetic field. When measuring the resonance conditions by changing the magnetic field, an EPR signal appeared in all of the deposited samples. The paper presents a general view of the EPR spectrum in all of the samples, including the signal intensity, g-factor, line widths, and normalized signal intensity of the carbon films on various substrates at temperatures from 0 °C to 800 °C. Studies show that with an increase in temperature, the normalized intensity of the EPR signal line increases during the deposition of a carbon in all deposited substrates (quartz, mica, and silicon) using the method of plasma decomposition of a mixture of methane and hydrogen.