Understanding of Molecular Contribution of Quinhydrone/Methanol Organic Passivation for Improved Minority Carrier Lifetime on Nanostructured Silicon Surface

Abstract

In this report, we present a study of the quinhydrone/methanol (QHY/MeOH) organic passivation technique for a silicon (Si) surface. The roles of p-benzoquinone (BQ) and hydroquinone (HQ), which make up QHY, in controlling the uniformity and coverage of the passivation layer as well as the minority carrier lifetime (τeff) of Si were investigated. The uniformity and coverage of the passivation layer after treatment with diverse mixture ratios of BQ and HQ in MeOH were studied with two different atomic force microscope (AFM) techniques, namely tunneling mode (TUNA) and high-resolution tapping mode AFM (HR-AFM). In addition, the τeff and surface potential voltages (SPV) of passivated surfaces were measured to clarify the relationship between the morphologies of the passivation layers and degrees of surface band bending. The molecular interactions between BQ and HQ in MeOH were also analyzed using Fourier-transform infrared spectroscopy (FT-IR). In our study, we successfully demonstrated the role of each molecule for effective Si surface passivation with BQ working as a passivation agent and HQ contributing as a proton (H+) donator to BQ for accelerating the passivation rate. However, our study also clearly revealed that HQ could also hinder the formation of a conformal passivation layer, which raises an issue for passivation over complex surface geometry, especially a nanostructured surface.