Atomic Layer Deposition of Cobalt Catalyst for Fischer–Tropsch Synthesis in Silicon Microchannel Microreactor

Abstract

In recent years, rising environmental concerns have led to the focus on some of the innovative alternative technologies to produce clean burning fuels. Fischer–Tropsch (FT) synthesis is one of the alternative chemical processes to produce synthetic fuels, which has a current research focus on reactor and catalyst improvements. In this work, a cobalt nanofilm (~4.5 nm), deposited by the atomic layer deposition (ALD) technique in a silicon microchannel microreactor (2.4 cm long × 50 µm wide × 100 µm deep), was used as a catalyst for atmospheric Fischer–Tropsch (FT) synthesis. The catalyst film was characterized by XPS, TEM-EDX, and AFM studies. The data from AFM and TEM clearly showed the presence of polygranular cobalt species on the silicon wafer. The XPS studies of as-deposited and reduced cobalt nanofilm in silicon microchannels showed a shift on the binding energies of Co 2p spin splits and confirmed the presence of cobalt in the Co0 chemical state for FT synthesis. The FT studies using the microchannel microreactor were carried out at two different temperatures, 240 °C and 220 °C, with a syngas (H2:CO) molar ratio of 2:1. The highest CO conversion of 74% was observed at 220 °C with the distribution of C1–C4 hydrocarbons. The results showed no significant selectivity towards butane at the higher temperature, 240 °C. The deactivation studies were performed at 220 °C for 60 h. The catalyst exhibited long-term stability, with only ~13% drop in the CO conversion at the end of 60 h. The deactivated cobalt film in the microchannels was investigated by XPS, showing a weak carbon peak in the XPS spectra.