Surface Chirality in Rotational Magnetoelectrodeposition of Copper Films

Abstract

Chiral surface formation was investigated in rotational magnetoelectrodeposition (RMED) of copper films, where an electrochemical cell was rotated in magnetic fields. The RMED was conducted with clockwise or anticlockwise rotation in the magnetic fields parallel or antiparallel to the ionic currents. The rotational frequencies were 0.5–6 Hz, and the magnetic fields were 2–5 T. The chiral behaviors are divided into four types: type I has chirality depending on the magnetic field polarity, type II has chirality depending on the rotational direction, and type III has chirality depending on both directions. Type IV represents chiral symmetry breaking, where the RMED films exhibit only L activity in any magnetic field polarity and rotational direction.