Optimization of Contact Resistance and DC Characteristics for AlGaN/GaN HEMTs Utilizing Sub-10 nm Nanohole Etching

Abstract

In this paper, the contact resistance of AlGaN/GaN high electron mobility transistor (HEMT) was improved by introducing nanoscale hole arrays in ohmic regions, and the DC characteristics of the conventional structure and nanohole etching structure for HEMTs were measured for comparison. Sub-10 nm nanoholes were patterned on the ohmic area surface of AlGaN using electron beam lithography and a low-temperature short-time development. Various dwell times of e-beam exposure from 5 to 30 μs were investigated and the corresponding contact resistance of the nano hole etching structure and planar structure were compared by the transmission line model (TLM) method. We observed a reduced contact resistance from 1.82 to 0.47 Ω-mm by performing a dwell time of 5 μs of exposure for nanohole formation compared to the conventional structure. Furthermore, the DC characteristics demonstrate that the maximum drain current for HEMTs was enhanced from 319 to 496 mA/mm by utilizing this optimized ohmic contact. These results show that devices with sub-10 nm nanohole ohmic contacts exhibit an improved contact resistance over the conventional structure, optimizing device performance for HEMTs, including a lower on-resistance and higher maximum drain current.