Synthesized Improvement of Die Fly and Die Shift Concerning the Wafer Molding Process for Ultrafine SAW Filter FOWLP

Author:

Li Wei1ORCID,Yu Daquan12ORCID

Affiliation:

1. School of Electronic Science and Engineering, Xiamen University, Xiamen 361005, China

2. Xiamen Sky Semiconductor Technology Co., Ltd., Xiamen 361026, China

Abstract

As the surface acoustic wave (SAW) filters incline to ultrafine, the failures resulting from the wafer molding process have become increasingly prominent. A methodology for coupling the mechanisms of die fly and die shift for the SAW filter miniatured with 737 μm × 517 μm × 200 μm is developed for the trade-off between reliability and yields. In terms of die fly and die shift, the former occurs before the epoxy molding compound (EMC) is cured in the temperature rise period, while the latter occurs in the cooling stage after being cured. The die fly is induced by the fluid flow force in the high-temperature stage of heat compression, which is fatal for the scrap. Followed by the cooling stage, the CTE (coefficient of thermal expansion) misalignment between the die and epoxy molding compound (EMC) seriously affects the die shift and the following lithography process yields. The debonding critical energy in the mixed mode is employed to avert the die fly. Then, the die fly can be shunned by fine-tuning the die thickness, die layout, and EMC layout. A methodology to measure die shift was conducted, by which a total of 47,568 dies were embedded using compression molding. The mechanical error of the mounter and the die shift law are comprehensively leveraged, indicating that the die shift can be controlled within 50 μm for 8-inch wafer-level packaging.

Funder

Science and Technology Major Project of Xiamen City

Publisher

MDPI AG

Subject

Electrical and Electronic Engineering,Computer Networks and Communications,Hardware and Architecture,Signal Processing,Control and Systems Engineering

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