The reactive gas pulsing process for tuneable properties of sputter deposited titanium oxide, nitride and oxynitride coatings-Reference-Cited by-同舟云学术

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The reactive gas pulsing process for tuneable properties of sputter deposited titanium oxide, nitride and oxynitride coatings

Published:2010 Issue:1/2 Volume:39 Page:159
ISSN:0268-1900
Container-title:International Journal of Materials and Product Technology
language:en
Short-container-title:IJMPT

Author:

Martin Nicolas,Besnard Aurelien,Sthal Fabrice,Takadoum Jamal

Publisher

Inderscience Publishers

Subject

Industrial and Manufacturing Engineering,Mechanical Engineering,Mechanics of Materials,Safety, Risk, Reliability and Quality

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Titanium oxynitride thin films by the reactive sputtering process with an independent pulsing of O2 and N2 gases;Thin Solid Films;2024-05

2. Tantalum Oxide Thin Films Sputter-Deposited by Oxygen Gas Pulsing;Coatings;2023-11-12

3. Structural, Optical, and Electronic Properties of Cu-Doped TiNxOy Grown by Ammonothermal Atomic Layer Deposition;ACS Applied Materials & Interfaces;2021-06-28

4. Temperature dependence of electrical resistivity in oxidized vanadium films grown by the GLAD technique;Surface and Coatings Technology;2016-10

5. METAL-TO-DIELECTRIC TRANSITION INDUCED BY ANNEALING OF ORIENTED TITANIUM THIN FILMS;Functional Materials Letters;2013-02

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