Effects of post-deposition annealing in oxygen ambient of RF magnetron sputtered Ga<SUB align="right">2O<SUB align="right">3 thin film
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Published:2022
Issue:2/3/4/5
Volume:19
Page:211
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ISSN:1475-7435
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Container-title:International Journal of Nanotechnology
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language:en
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Short-container-title:IJNT
Author:
Hedei Puteri Haslinda Megat Abdul,Hassan Zainuriah,Quah Hock Jin
Publisher
Inderscience Publishers
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Bioengineering