Sub-Micron-Wide Surficial Trench Frames to Define the Coating Areas of Sensitive Layers on Silicon MEMS Resonant Chemical Sensors-Reference-Cited by-同舟云学术

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Sub-Micron-Wide Surficial Trench Frames to Define the Coating Areas of Sensitive Layers on Silicon MEMS Resonant Chemical Sensors

Published:2013-09-11 Issue:10 Volume:96 Page:60-66
ISSN:1942-9533
Container-title:Electronics and Communications in Japan
language:en
Short-container-title:Electron. Comm. Jpn.

Author:

Murakami Sunao¹,Ikehara Tsuyoshi¹,Konno Mitsuo¹,Maeda Ryutaro¹,Fukawa Tadashi²,Kimura Mutsumi²,Mihara Takashi³

Affiliation:

1. Research Center for Ubiquitous MEMS and Micro Engineering (UMEMSME); National Institute of Advanced Industrial Science and Technology; Japan

2. Shinshu University; Japan

3. Olympus Corporation; Japan

Publisher

Wiley

Subject

Applied Mathematics,Electrical and Electronic Engineering,Computer Networks and Communications,General Physics and Astronomy,Signal Processing

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/ecj.11379/fullpdf

Reference13 articles.

1. Ultimate limits to inertial mass sensing based upon nanoelectromechanical systems;Ekincia;J Appl Phys,2004

2. High Q factor plate resonators for ultrasensitive mass sensing applications;Agache;IEEE Transducers Tech Dig,2009

3. Resonators with integrated CMOS circuitry for mass sensing applications, fabricated by electron beam lithography;Ghatnekar-Nilsson;Nanotechnology,2005

4. Sub-ppm detection of vapors using piezoresistive microcantilever array sensors;Yoshikawa;Nanotechnology,2009

5. Detection of volatile organic compounds (VOCs) with polymer-coated cantilevers;Maute;Sens Actuators B,1999

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