Contaminations and Impurities in DC Magnetron Sputtered WSix Films on SiO2

Author:

Sundahl M. J.,Irwin R. B.,Nanda A.,Wilkins C. W.,Rambabu B.

Publisher

Wiley

Subject

Condensed Matter Physics,Electronic, Optical and Magnetic Materials,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference31 articles.

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1. Deposition of tungsten disilicide films by DC magnetron sputtering at ultra-low operating pressure;Surface and Coatings Technology;2021-09

2. Silicides;digital Encyclopedia of Applied Physics;2003-04-15

3. Silicides and ohmic contacts;Materials Chemistry and Physics;1998-02

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