Effects of Pre-annealing on Firing Stability of Atomic Layer-Deposited Al2O3-Reference-Cited by-同舟云学术

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Effects of Pre-annealing on Firing Stability of Atomic Layer-Deposited Al2O3

Published:2015-06-10 Issue:10 Volume:55 Page:1075-1080
ISSN:0021-2148
Container-title:Israel Journal of Chemistry
language:en
Short-container-title:Isr. J. Chem.

Author:

Bae Soohyun,Kim Soo Min,Lee Kyung Dong,Kim Young Do,Park Sungeun,Kang Yoonmook,Lee Hae-Seok,Kim Donghwan

Funder

Human Resources Development Program

Korea Institute of Energy Technology Evaluation and Planning (KETEP)

Korean government

Ministry of Trade, Industry, and Energy

New & Renewable Energy

Korean government’s Ministry of Trade, Industry, and Energy

Publisher

Wiley

Subject

General Chemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/ijch.201400192/fullpdf

Reference18 articles.

1. Role of field-effect on c-Si surface passivation by ultrathin (2–20 nm) atomic layer deposited Al2O3

2. Electronic and chemical properties of the c-Si/Al2O3 interface

3. Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells

4. Surface passivation of phosphorus-diffused n+-type emitters by plasma-assisted atomic-layer deposited Al2O3

5. 19.4%-efficient large-area fully screen-printed silicon solar cells

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Surface Passivation of Boron Emitters on n-Type Silicon Solar Cells;Sustainability;2019-07-10

2. Effects of Annealing on Firing Stability of a Al2O3/SiNx Stack Passivation Layer for Crystalline Silicon Solar Cells;Journal of Nanoscience and Nanotechnology;2017-07-01

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