Synthesis and radiation degradation of vinyl polymers with fluorine: Search for improved lithographic resists-Reference-Cited by-同舟云学术

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Synthesis and radiation degradation of vinyl polymers with fluorine: Search for improved lithographic resists

Published:1980-12 Issue:12 Volume:18 Page:3413-3425
ISSN:0360-6376
Container-title:Journal of Polymer Science: Polymer Chemistry Edition
language:
Short-container-title:J. Polym. Sci. Polym. Chem. Ed.

Author:

Pittman Charles U.,Chen Chi-Yu,Ueda Mitsuru,Helbert J. N.,Kwiatkowski J. H.

Publisher

Wiley

Cited by 32 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. Long‐Range Ordered Double Gyroid Structures via Solution Casting from Poly(2,2,2‐trifluoroethyl methacrylate)‐ block ‐poly(2‐vinyl pyridine);Macromolecular Chemistry and Physics;2021-10-10

3. Perpendicular Orientation Control without Interfacial Treatment of RAFT-Synthesized High-χ Block Copolymer Thin Films with Sub-10 nm Features Prepared via Thermal Annealing;ACS Applied Materials & Interfaces;2017-03-17

4. Dual Mode Patterning of Fluorine-Containing Block Copolymers through Combined Top-down and Bottom-up Lithography;Chemistry of Materials;2012-04-02

5. Acrylate-based fluorinated copolymers for high-solids coatings;Progress in Organic Coatings;2011-07

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