Stacked and nanolaminated Al2 O3 /TiO2 for surface passivation and encapsulation of silicon
Author:
Affiliation:
1. Global Frontier Center for Multiscale Energy Systems, Seoul National University; 151-744 Seoul Republic of Korea
Publisher
Wiley
Subject
Condensed Matter Physics,General Materials Science
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/pssr.201510143/fullpdf
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1. Layered tantalum-aluminum oxide films deposited by atomic layer epitaxy
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4. Growth of ZnO/Al2O3 Alloy Films Using Atomic Layer Deposition Techniques
5. Atomic Layer Deposition: An Overview
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1. Status of Al 2 O 3 /TiO 2 ‐Based Antireflection and Surface Passivation for Silicon Solar Cells;physica status solidi (RRL) – Rapid Research Letters;2021-08-08
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4. Photocatalytic Behavior of Fluorinated Rutile TiO2 (110) Surface: Understanding from the Band Model;Solar RRL;2017-11-27
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