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Compositional analysis of SiOxNy:H films by heavy-ion ERDA: the problem of radiation damage

  • Published:2002-08 Issue:1 Volume:34 Page:749-753
  • ISSN:0142-2421
  • Container-title:Surface and Interface Analysis
  • language:en
  • Short-container-title:Surf. Interface Anal.

Author:

Bohne W.,Fuhs W.,Röhrich J.,Selle B.,Sieber I.,del Prado A.,San Andrés E.,Mártil I.,González-Díaz G.

Funder

Bundesministerium für Wirtschaft und Technologie, Germany

CICYT, Spain

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Implementation of heavy-ion elastic recoil detection analysis at JANNUS-Saclay for quantitative helium depth profiling;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2015-10

2. Selective synthesis and characterization of HYSYCVD-Si2N2O;Materials Chemistry and Physics;2009-03

3. Physical properties of high pressure reactively sputtered TiO2;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2005-11

4. Influence of H on the composition and atomic concentrations of “N-rich” plasma deposited SiOxNyHz films;Journal of Applied Physics;2004-05-15

5. Compositional analysis of thin SiOxNy:H films by heavy-ion ERDA, standard RBS, EDX and AES: a comparison;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2004-04
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