Chemical Vapor Deposition of Phase‐Pure Uranium Dioxide Thin Films from Uranium(IV) Amidate Precursors-Reference-Cited by-同舟云学术

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Chemical Vapor Deposition of Phase‐Pure Uranium Dioxide Thin Films from Uranium(IV) Amidate Precursors

Published:2019-03-20 Issue:17 Volume:131 Page:5805-5809
ISSN:0044-8249
Container-title:Angewandte Chemie
language:en
Short-container-title:Angew. Chem.

Author:

Straub Mark D.¹²^ORCID,Leduc Jennifer³^ORCID,Frank Michael³^ORCID,Raauf Aida³,Lohrey Trevor D.¹²,Minasian Stefan G.²,Mathur Sanjay³^ORCID,Arnold John¹²^ORCID

Affiliation:

1. Department of Chemistry University of California, Berkeley Berkeley CA 94720 USA

2. Heavy Element Chemistry Group Chemical Sciences Division Lawrence Berkeley National Lab Berkeley CA 94720 USA

3. Institute of Inorganic Chemistry University of Cologne 50939 Cologne Germany

Funder

U.S. Department of Energy

Deutscher Akademischer Austauschdienst

Deutsche Forschungsgemeinschaft

Universität zu Köln

Publisher

Wiley

Subject

General Medicine

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/ange.201901924

Reference30 articles.

1. Materials challenges in nuclear energy

2. Accident tolerant fuels for LWRs: A perspective

3. High resolution TEM of high burnup UO2 fuel

4. Characterization of uranium oxide thin films grown from solution onto Fe surfaces

5. Surface reactions of uranium oxide powder, thin films and single crystals

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Modeling Heterogeneity in UO ₂ Nanoparticles Using X‐ray Absorption Spectroscopy;European Journal of Inorganic Chemistry;2022-12-07

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