Enhanced Performance of Organic Field‐Effect Transistor with Bi‐Functional N‐Type Organic Semiconductor Layer

Author:

Yu Tianpeng1ORCID,Hou Shuyi1,Liu Zhenliang1,Wang Yiru2,Yin Jiang12ORCID,Gao Xu3,Liu Nannan4,Yuan Guoliang4,Wu Lei5,Xia Yidong1,Liu Zhiguo1

Affiliation:

1. College of Engineering and Applied Sciences Jiangsu Key Laboratory of Artificial Functional Materials and National Laboratory of Solid State Microstructures Nanjing University Nanjing 210093 P. R. China

2. State Key Laboratory of Organic Electronics and Information Displays & Institute of Advanced Materials Nanjing University of Posts & Telecommunications Nanjing 210023 P. R. China

3. Institute of Functional Nano and Soft Materials (FUNSOM) Jiangsu Key Laboratory for Carbon‐Based Functional Materials & Devices Soochow University Suzhou Jiangsu 215123 P. R. China

4. School of Materials Science and Engineering Nanjing University of Science and Technology Nanjing 210094 P. R. China

5. College of Electrical Engineering Nanjing Vocational University of Industry Technology Nanjing 210023 P. R. China

Abstract

AbstractOrganic field‐effect transistors (OFETs) hold great promise for applications in non‐volatile memories, detectors, and artificial synapses due to the good flexibility and biocompatibility. However, certain drawbacks such as high operating voltages and significant degradation in endurance characteristics have hindered their practical implementations. Herein, a novel approach is proposed to enhance the performance of OFETs by incorporating a bi‐functional n‐type polymer semiconductor interlayer, Poly‐{[N,N'‐bis(2‐octyldodecyl)naphthalene‐1,4,5,8‐bis(dicarboximide)‐2,6‐diyl]‐alt‐5,5′‐(2,2′‐bithiophene)} (N2200), into a pentacene OFET structure. The device exhibits remarkable improvements, with reliable P/E operation cycles of over than 104 and a retention time of more than 10 years. On one hand, the inclusion of N2200 as an n‐type semiconductor effectively reduces the height of hole‐injection barrier for trapping and thus reducing the working voltage based on the electrostatic induction theory. On the other hand, n‐type semiconductor N2200 serves as a native hole‐consumption (or hole‐trapping) dielectric, and its narrower bandgap restrains the formation of deep hole‐traps, thus favoring the endurance characteristics of the OFET.

Funder

National Key Research and Development Program of China

National Natural Science Foundation of China

Fundamental Research Funds for the Central Universities

Priority Academic Program Development of Jiangsu Higher Education Institutions

Publisher

Wiley

Subject

Electronic, Optical and Magnetic Materials

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