LaAlO3/SrTiO3 Heterointerface: 20 Years and Beyond

Author:

Chen Shunfeng1ORCID,Ning Yuanjie1,Tang Chi Sin2ORCID,Dai Liang1,Zeng Shengwei3,Han Kun4,Zhou Jun3,Yang Ming5ORCID,Guo Yanqun1,Cai Chuanbing1,Ariando Ariando6,Wee Andrew T. S.6,Yin Xinmao1ORCID

Affiliation:

1. Shanghai Key Laboratory of High Temperature Superconductors Department of Physics Shanghai University Shanghai 200444 China

2. Singapore Synchrotron Light Source (SSLS) National University of Singapore Singapore 117603 Singapore

3. Institute of Materials Research and Engineering (IMRE) Agency for Science, Technology and Research (A*STAR) 2 Fusionopolis Way, Innovis #08‐03 Singapore 138634 Singapore

4. Information Materials and Intelligent Sensing Laboratory of Anhui Province Institutes of Physical Science and Information Technology Anhui University Hefei 230601 China

5. Department of Applied Physics The Hong Kong Polytechnic University Kowloon Hong Kong China

6. Department of Physics Faculty of Science National University of Singapore Singapore 117542 Singapore

Abstract

AbstractThis year marks the 20th anniversary of the discovery of LaAlO3/SrTiO3 (LAO/STO) oxide heterointerfaces. Since their discovery, transition metal oxide (TMO) interfaces have emerged as a fascinating and fast‐growing area of research, offering a variety of unique and exotic physical properties which has provided a strong impetus for the rapid advances and actualization of oxide electronics. This review revisits the fundamental mechanisms accounting for the two‐dimensional (2D) conducting interfaces, and how new models proposed to better account for the unique interfacial effects. Recent breakthroughs in the theoretical and experimental domains of oxide interfaces are also discussed including the detection and investigation of 2D quasiparticle. Moving beyond the well‐known LAO/STO interface, this review delves into other systems where unconventional interfacial superconductivity, interfacial magnetism, and spin polarization are dealt with in greater detail. In terms of device applications, this review proceeds with a treatment on the recent developments in domains including field effect transistors and freestanding heterostructure membranes. By emphasizing the opportunities and challenges of integrating oxide interfaces with existing technologies, the review will end off with an outlook projecting the progress and the trajectory of this research domain in the years to come.

Funder

National Natural Science Foundation of China

National Key Research and Development Program of China

Science and Technology Innovation Plan Of Shanghai Science and Technology Commission

Publisher

Wiley

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