Second-Order Optical Nonlinearity in Silicon Waveguides: Inhomogeneous Stress and Interfaces

Author:

Schriever Clemens1,Bianco Federica23,Cazzanelli Massimo2,Ghulinyan Mher4,Eisenschmidt Christian5,de Boor Johannes6,Schmid Alexander7,Heitmann Johannes7,Pavesi Lorenzo2,Schilling Jörg1

Affiliation:

1. Centre for Innovation Competence SiLi-nano; Martin-Luther-University Halle-Wittenberg; Karl-Freiherr-von-Fritsch-Str. 3 06120 Halle (Saale) Germany

2. Nanoscience Laboratory; Department of Physics; University of Trento; via Sommarive 14 38123 Povo Trento Italy

3. NEST; Istituto Nanoscienze-CNR and Scuola Normale Superiore; P.za S, Silvestro 12 56127 Pisa Italy

4. Department of Advanced Photonics and Photovoltaics; Centre of Materials and Microsystems; Bruno Kessler Foundation; via Sommarive 18 38123 Povo Trento Italy

5. Institute of Physics; Martin-Luther-University Halle-Wittenberg; Heinrich-Damerow-Str. 4 06120 Halle (Saale) Germany

6. Max Planck Institute of Microstructure Physics; Weinberg 2 06120 Halle (Saale) Germany

7. Institut für Angewandte Physik; TU Bergakademie Freiberg; Leipziger Str. 23 09599 Freiberg Germany

Publisher

Wiley

Subject

Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

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