A novel silicon texturization method based on etching through a silicon nitride mask-Reference-Cited by-同舟云学术

A novel silicon texturization method based on etching through a silicon nitride mask

Published:2005 Issue:8 Volume:13 Page:691-695
ISSN:1062-7995
Container-title:Progress in Photovoltaics: Research and Applications
language:en
Short-container-title:Prog. Photovolt: Res. Appl.

Author:

Weber K. J.,Blakers A. W.

Publisher

Wiley

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference14 articles.

1. , , , , , , , , . Systematic study towards high efficiency multicrystalline silicon solar cells with mechanical surface texturization. Conference Record of the Twenty Sixth IEEE Photovoltaic Specialists Conference, 1997; 243-246.

2. Rie-texturing of multicrystalline silicon solar cells

3. Cost-effective methods of texturing for silicon solar cells

4. Investigation of Acidic Texturization for Multicrystalline Silicon Solar Cells

5. Texturing of polycrystalline silicon

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