The Blue‐LED‐Sensitive Naphthoquinone‐Imidazolyl Derivatives as Type II Photoinitiators of Free Radical Photopolymerization

Author:

Borjigin Timur12,Schmitt Michael12,Giacoletto Nicolas3,Rico Alexandre3,Bidotti Hugo3,Nechab Malek3,Zhang Yijun12,Graff Bernadette12,Morlet‐Savary Fabrice12,Xiao Pu4,Dumur Frédéric3,Lalevée Jacques12ORCID

Affiliation:

1. Université de Haute‐Alsace CNRS IS2M UMR 7361 Mulhouse F‐68100 France

2. Université de Strasbourg Strasbourg F‐67000 France

3. Aix Marseille Univ CNRS ICR UMR 7273 Marseille F‐13397 France

4. Research School of Chemistry Australian National University Canberra ACT 2601 Australia

Abstract

AbstractIn this work, new naphthoquinone‐based photoinitiators are synthesized and applied for the first time in free radical photopolymerization. In the presence of acrylate monomers, these PIs display excellent photoinitiation capabilities under blue‐light LED@405 nm irradiation in a two‐component photoinitiating system in which the additive is a common iodonium salt (bis‐(4‐tert‐butylphenyl)iodonium hexafluorophosphate ‐ Iod) or a tertiary amine (ethyl 4‐dimethylaminobenzoate ‐ EDB). In controlled tests, the polymerization performance of dye4/Iod is equal to or better than that of common commercial Type II photoinitiators (2‐isopropylthioxanthone and benzophenone). Meanwhile, only a trace amount of photoinitiator is required (as low as 0.05%) to initiate the photopolymerization. It is worth noting that some of these compounds can also be used in one‐component photoinitiating system (monocomponent Type II behavior) and exhibit high photoinitiation ability. A series of complementary characterization analyses of two new naphthoquinone dyes (i.e. dye 1 and dye 4) with very similar chemical structures are carried out to investigate the relevant photochemical mechanism. Finally, 3D printing experiments are carried out by a simple and convenient Direct Laser Write (DLW) technique.

Funder

China Scholarship Council

Australian Research Council

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

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