Selectivity Enhancement for Ruthenium Atomic Layer Deposition in Sub‐50 nm Nanopatterns by Diffusion and Size‐Dependent Reactivity-Reference-Cited by-同舟云学术

Selectivity Enhancement for Ruthenium Atomic Layer Deposition in Sub‐50 nm Nanopatterns by Diffusion and Size‐Dependent Reactivity

Published:2021-09-23 Issue:20 Volume:8 Page:2100846
ISSN:2196-7350
Container-title:Advanced Materials Interfaces
language:en
Short-container-title:Adv. Mater. Interfaces

Author:

Clerix Jan‐Willem J.¹²^ORCID,Marques Esteban A.¹²,Soethoudt Job¹²^ORCID,Grillo Fabio³^ORCID,Pourtois Geoffrey²^ORCID,Van Ommen J. Ruud⁴^ORCID,Delabie Annelies¹²^ORCID

Affiliation:

1. Department of Chemistry KU Leuven Celestijnenlaan 200F Heverlee 3001 Belgium

2. Imec Kapeldreef 75 Heverlee 3001 Belgium

3. Department of Materials ETH Zurich Zurich 8093 Switzerland

4. Department of Chemical Engineering TU Delft Delft 2629 HZ The Netherlands

Funder

Fonds Wetenschappelijk Onderzoek

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/admi.202100846

Reference47 articles.

1. The chips are down for Moore’s law

2. The use of atomic layer deposition in advanced nanopatterning

3. From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity

4. Perspective: New process technologies required for future devices and scaling

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