Modelling of Magnetron Sputtering of Tungsten Oxide with Reactive Gas Pulsing
Author:
Publisher
Wiley
Subject
Polymers and Plastics,Condensed Matter Physics
Reference19 articles.
1. Control of reactive sputtering processes
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1. Tungsten Oxide Thin Films for Electrochromic Applications: Pulse Width‐Controlled Deposition by High‐Power Impulse Magnetron Sputtering;Advanced Engineering Materials;2024-02-13
2. Tailoring the structural and optical properties of fabricated TiO2 thin films by O2 duty cycle in reactive gas-timing magnetron sputtering;Vacuum;2023-08
3. Controlled grain-size thermochromic VO2 coatings by the fast oxidation of sputtered vanadium or vanadium oxide films deposited at glancing angles;Surfaces and Interfaces;2021-12
4. Influence of sputtered species ionisation on the hysteresis behaviour of reactive HiPIMS with oxygen admixture;Plasma Sources Science and Technology;2020-02-01
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