Ti-Si-N Films with a High Content of Si
Author:
Publisher
Wiley
Subject
Polymers and Plastics,Condensed Matter Physics
Reference17 articles.
1. Mechanisms of reactive sputtering of titanium nitride and titanium carbide I: Influence of process parameters on film composition
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3. “Physical and mechanical properties of hard nanocomposite films prepared by reactive magnetron sputtering”, in: Nanostructured Hard Coatings, , Eds., Springer Science+Business Media, LLC, New York, USA 2006, Chapter 10 in the book, pp. 407.
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5. Structure and properties of magnetron sputtered Zr–Si–N films with a high (≥25 at.%) Si content
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