Characterization of fractionated phenolic resins used in photoresists
Author:
Publisher
Wiley
Subject
Materials Chemistry,Polymers and Plastics,General Chemistry,Materials Chemistry,Polymers and Plastics,General Chemistry
Reference18 articles.
1. Microchip Fabrication: A Practical Guide to Semiconductor Processing, 2nd Ed., McGraw-Hill, New York (1990).
2. Isolation of novolak resin at low temperature
3. Novolak design concept for high performance positive photoresists
4. Novolak Design For High Resolution Positive Photoresists(II): Stone Wall Model For Positive Photoresist Development
5. Novolak design for high-resolution positive photoresists (IV): tandem-type novolak resin for high-performance positive photoresists
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