P‐65: Strategic Realization of the Highest Possible Pixel Density for Quantum Dot Color Converter with Optimized Performance

Author:

Chen Chih-Jung1,Chen Kuan-An2,Kuo Wei-Hung3,Wu Chun-I3,Shen Jia-Wun4,Kuo Hao-Chung56,Chiang Ray-Kuang1

Affiliation:

1. Taiwan Nanocrystals Corp. Ltd. Tainan Taiwan, R.O.C.

2. SynthEdge Advanced Materials Corp. Ltd. Taoyuan Taiwan, R.O.C.

3. Industrial Technology Research Institute Hsinchu Taiwan, R.O.C.

4. ISSBG Group Hon Hai Precision Industry Ltd. Taipei Taiwan, R.O.C

5. Department of Photonics and Graduate Institute of Electro-Optical Engineering, College of Electrical and Computer Engineering National Chiao Tung University Hsinchu Taiwan, R.O.C. 30010

6. Semiconductor Research Center Hon Hai Research Institute Taipei Taiwan, R.O.C

Abstract

The light extraction efficiency of QDCC (quantum dot color converter) is low when its aspect ratio (width to thickness ratio) of a subpixel is less than two, which causes the problem in their high‐resolution applications. Using QDPR (quantum dot photoresist) of high OD (optical density) values and PenTile subpixel arrangement, an apparent high‐resolution application is feasible, in which the QDCC film thickness is less than 2 μm. Further incorporation of yellow color filter film or color purified layer (CPL) on the QDCC film can optimize its optical performance. Theoretically, QDCC with pixel density over 3000 ppi is achievable when it is directly applied to the CMOS substrate. In a trial test QDCC is applied on a glass substrate, which results in pixel density of 2116 ppi and color gamut of NTSC 109.64%.

Publisher

Wiley

Subject

General Medicine

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