Low‐Temperature Vapor‐Phase Growth of 2D Metal Chalcogenides

Author:

Zhang Kenan12,Zhang Tianyi1,You Jiawen2,Zheng Xudong1,Zhao Mei3,Zhang Lijie3,Kong Jing1,Luo Zhengtang24,Huang Shaoming56ORCID

Affiliation:

1. Department of Electrical Engineering and Computer Science Massachusetts Institute of Technology Cambridge MA 02139 USA

2. Department of Chemical and Biological Engineering Guangdong‐Hong Kong‐Macao Joint Laboratory for Intelligent Micro‐Nano Optoelectronic Technology William Mong Institute of Nano Science and Technology, and Hong Kong Branch of Chinese National Engineering Research Center for Tissue Restoration and Reconstruction The Hong Kong University of Science and Technology Kowloon 999077 China

3. Key Laboratory of Carbon Materials of Zhejiang Province College of Chemistry and Materials Engineering Wenzhou University Wenzhou 325035 China

4. Hong Kong University of Science and Technology‐Shenzhen Research Institute Nanshan Shenzhen 518057 China

5. Guangzhou Key Laboratory of Low‐Dimensional Materials and Energy Storage Devices School of Materials and Energy Guangdong University of Technology Guangzhou 510006 China

6. School of Chemistry and Materials Science Hangzhou Institute for Advanced Study University of Chinese Academy of Sciences Hangzhou 310024 China

Abstract

Abstract2D metal chalcogenides (MCs) have garnered significant attention from both scientific and industrial communities due to their potential in developing next‐generation functional devices. Vapor‐phase deposition methods have proven highly effective in fabricating high‐quality 2D MCs. Nevertheless, the conventionally high thermal budgets required for synthesizing 2D MCs pose limitations, particularly in the integration of multiple components and in specialized applications (such as flexible electronics). To overcome these challenges, it is desirable to reduce the thermal energy requirements, thus facilitating the growth of various 2D MCs at lower temperatures. Numerous endeavors have been undertaken to develop low‐temperature vapor‐phase growth techniques for 2D MCs, and this review aims to provide an overview of the latest advances in low‐temperature vapor‐phase growth of 2D MCs. Initially, the review highlights the latest progress in achieving high‐quality 2D MCs through various low‐temperature vapor‐phase techniques, including chemical vapor deposition (CVD), metal‐organic CVD, plasma‐enhanced CVD, atomic layer deposition (ALD), etc. The strengths and current limitations of these methods are also evaluated. Subsequently, the review consolidates the diverse applications of 2D MCs grown at low temperatures, covering fields such as electronics, optoelectronics, flexible devices, and catalysis. Finally, current challenges and future research directions are briefly discussed, considering the most recent progress in the field.

Funder

National Natural Science Foundation of China

Publisher

Wiley

Subject

Biomaterials,Biotechnology,General Materials Science,General Chemistry

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