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The Chemistry of Wet Cleaning

Published:2011-02-22 Issue: Volume: Page:39-94
ISSN:
Container-title:Handbook of Cleaning in Semiconductor Manufacturing
language:
Short-container-title:

Author:

Knotter D. Martin

Publisher

John Wiley & Sons, Inc.

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/9781118071748.ch2/fullpdf

Reference96 articles.

1. Effects of Various Chemistries on Silicon-Wafer Cleaning

2. Tardif , F. Lardin , T. Boelen , P. Novak , R. Kashkoush , I. Proc. 3 rd International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS) , (Heyns, M., Meuris, M., and Mertens, P., eds.), p. 175 Antwerp, Belgium 1996

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1. Cleaning of laser-induced periodic surface structures on copper by gentle wet chemical processing;Applied Surface Science;2025-01

2. Cleaning of Laser-Induced Periodic Surface Structures on Copper by Gentle Wet Chemical Processing;2024

3. Catalytic Oxidation of CO and Benzene over Metal Nanoparticles Loaded on Hierarchical MFI Zeolite;Molecules;2021-09-28

4. Operation of a New Electrolyzed Cell Using Boron Doped Diamond Electrodes ;Solid State Phenomena;2014-09

5. The Chemistry of Wet Surface Preparation;Chemistry in Microelectronics;2013-03-14

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