Tube‐type plasma‐enhanced atomic layer deposition of aluminum oxide: Enabling record lab performance for the industry with demonstrated cell efficiencies >24%-Reference-Cited by-同舟云学术

Tube‐type plasma‐enhanced atomic layer deposition of aluminum oxide: Enabling record lab performance for the industry with demonstrated cell efficiencies >24%

Published:2022-07-16 Issue:1 Volume:31 Page:52-61
ISSN:1062-7995
Container-title:Progress in Photovoltaics: Research and Applications
language:en
Short-container-title:Progress in Photovoltaics

Author:

Liao Baochen¹²^ORCID,Wu Xinyuan²³^ORCID,Wu Weiliang⁴,Liu Changming⁵,Ma Sheng²⁶,Wang Shaozhou³^ORCID,Xie Tong³,Wang Qiang¹,Du Zheren⁷,Shen Wenzhong⁶,Li Xiang²,Li Weimin²,Hoex Bram³

Affiliation:

1. School of Information Science and Technology Nantong University Nantong Jiangsu China

2. Jiangsu Leadmicro Nano‐Equipment Technology Ltd. Wuxi Jiangsu China

3. School of Photovoltaic and Renewable Energy Engineering University of New South Wales Sydney Australia

4. Tongwei Solar Co., Ltd. Meishan Sichuan China

5. Jinko Solar Holding Co., Ltd., Haining Zhejiang China

6. Institute of Solar Energy Shanghai Jiao Tong University Shanghai China

7. Jolywood Solar Technology Co. Ltd. Taizhou Jiangsu China

Funder

Major State Basic Research Development Program of China

Publisher

Wiley

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/pip.3607

Reference80 articles.

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5. Surface passivation of crystalline silicon solar cells: Present and future

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