A Nanoimprint Lithography Hybrid Photoresist Based on the Thiol-Ene System
Author:
Publisher
Wiley
Subject
Electrochemistry,Condensed Matter Physics,Biomaterials,Electronic, Optical and Magnetic Materials
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/adfm.201100692/fullpdf
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3. Nanoscale silicon field effect transistors fabricated using imprint lithography
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