Dissociative photoionization of Al2(Ch3)6 and Al2(Ch3)3Cl3 in the range 40-100 eV
Author:
Publisher
Wiley
Subject
Inorganic Chemistry,General Chemistry
Reference33 articles.
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1. Site-specific phenomena in Si:2p core-level photoionization of X3Si(CH2)nSi(CH3)3 (X=F or Cl, n=0–2) condensed on a Si(111) surface;Chemical Physics;1999-10
2. Photon energy dependence of synchrotron radiation induced growth suppression and initiation in Al chemical vapor deposition II. Surface analysis by Auger electron spectroscopy;Applied Surface Science;1996-11
3. Dissociative double ionization following valence and Si:2p core level photoexcitation of SiCl4 in the range 38-133 eV;The Journal of Physical Chemistry;1995-09
4. Dissociative Photoionization of $\bf Bis(dimethyl\mbox{-}\mbi{\mu}\mbox{-}isopropylamido\mbox{-}aluminum)$ and $\bf Bis(dimethyl\mbox{-}\mbi{\mu}\mbox{-}t\mbox{-}butylamido\mbox{-}aluminum)$ in the Region $\bf {\mbi h}{\bf \nu}=65\mbox{-}133 eV$ by Mass Spectrometry;Japanese Journal of Applied Physics;1995-07-15
5. Site‐specific fragmentation following Si:2pcore‐level photoexcitation of F3SiCH2Si(CH3)3in the vapor phase;The Journal of Chemical Physics;1995-04-15
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