A Photolithography‐Free Fabrication Strategy for Perovskite Photodetector Array with High‐Security Imaging Application

Author:

Zhang Jianfeng1ORCID,Ding Ziyi12,Liu Zhanwei1,Li Guijun3,Kwok Hoi‐Sing4,Liu Yuan1

Affiliation:

1. School of Integrated Circuits Guangdong University of Technology Guangzhou Guangdong 510006 China

2. College of Physics and Optoelectronic Engineering Guangdong University of Technology Guangzhou Guangdong 510006 China

3. College of Physics and Optoelectronic Engineering Shenzhen University Shenzhen 518060 China

4. Department of Electronic and Computer Engineering The Hong Kong University of Science and Technology Kowloon Hong Kong 999077 China

Abstract

AbstractMetal halide perovskites have attracted significant attention for high‐performance and cost‐effective photodetector (PD) arrays in recent years. Traditional perovskite photodetector arrays typically rely on planar structure and photolithography, which limit resolution and involve complex, costly processes. To address these challenges, an innovative, lithography‐free fabrication strategy is proposed utilizing direct laser writing ablation and a surface energy‐assisted selective growth process. A 10 × 10 self‐powered perovskite photodetector array is demonstrated with a vertical cross‐bar structure fabricated on a laser‐ablated textured Indium‐Tin Oxide (ITO) substrate which improves the device performance. The device exhibits a fast photoresponse and effective imaging capability. Moreover, the intrinsic physical disorder and randomness of perovskite provide highly secure entropy sources, making the photodetector array suitable for physical unclonable function (PUF) devices. This method offers a promising opportunity for simplifying the fabrication process, enhancing manufacturability, and advancing the application of perovskite PD arrays in secure imaging systems.

Funder

National Natural Science Foundation of China

Publisher

Wiley

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