A model for atomic mixing-Reference-Cited by-同舟云学术

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A model for atomic mixing

Published:1990-06 Issue:2 Volume:3 Page:157-169
ISSN:0894-3370
Container-title:International Journal of Numerical Modelling: Electronic Networks, Devices and Fields
language:en
Short-container-title:Int. J. Numer. Model.

Author:

Wadsworth M.,Armour D. G.,Badheka R.,Collins R.

Publisher

Wiley

Subject

Electrical and Electronic Engineering,Computer Science Applications,Modelling and Simulation

Reference13 articles.

1. The diffusion approximation in atomic mixing

2. Atomic mixing of silver into a silicon substrate using a 45 keV beam of Ar+ ions

3. Non-linear differential equation for atomic mixing: 2. Numerical results

4. Distortion of depth profiles during sputtering

5. Distortion of depth profiles during ion bombardment II. Mixing mechanisms

Cited by 17 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The inverse solution of the atomic mixing equations by an operator-splitting method;Applied Mathematical Modelling;2014-04

2. Solution of inverse diffusion problems by operator-splitting methods;Applied Mathematical Modelling;2002-10

3. Profile Changes and Self-sputtering during Low Energy Ion Implantation.;MRS Proceedings;2002

4. Modeling of bombardment induced oxidation of silicon;Journal of Applied Physics;2001-03

5. Atomic mixing and erosion model applied to polymers;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2000-12

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