Calix[4]resorcinarene Derivatives as High-Resolution Resist Materials for Supercritical CO2 Processing
Author:
Publisher
Wiley
Subject
Mechanical Engineering,Mechanics of Materials,General Materials Science
Reference36 articles.
1. Novel class of low molecular‐weight organic resists for nanometer lithography
2. A positive-working alkaline developable photoresist based on partially tert-Boc-protected calix[4]resorcinarene and a photoacid generator
3. Sub-50 nm feature sizes using positive tone molecular glass resists for EUV lithography
4. Molecular glass photoresists for advanced lithography
5. Molecular Glass Resists for High-Resolution Patterning
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