Monte Carlo calculated absorbed‐dose energy dependence of EBT3 and EBT4 films for 5–200 MeV electrons and 100 keV–15 MeV photons

Abstract

AbstractPurposeTo use Monte Carlo simulations to study the absorbed‐dose energy dependence of GAFChromic EBT3 and EBT4 films for 5–200 MeV electron beams and 100 keV–15 MeV photon beams considering two film compositions: a previous EBT3 composition (Bekerat et al.) and the final composition of EBT3/current composition of EBT4 (Palmer et al.).MethodsA water phantom was simulated with films at 5–50 mm depth in 5 mm intervals. The water phantom was irradiated with flat, monoenergetic 5–200 MeV electron beams and 100 and 150 keV kilovoltage and 1–15 MeV megavoltage photon beams and the dose to the active layer of the films was scored. Simulations were rerun with the films defined as water to compare the absorbed‐dose response of film to water, .ResultsFor electrons, the Bekerat et al. composition had variations in of up to from 5 to 200 MeV. Similarly, the Palmer et al. composition had differences in up to from 5 to 200 MeV. For photons, varied up to and from 100 keV to 15 MeV for the Bekerat et al. and Palmer et al. compositions, respectively. The depth of films did not appear to significantly affect for photons at any energy and for electrons at energies  50 MeV. However, for 5 and 10 MeV electrons, decreases of up to in were seen due to stacked films and increased beam attenuation in films compared to water.ConclusionsThe up to and variations in for electrons and photons, respectively, across the energies considered in this study indicate the importance of calibrating films with the energy intended for measurement. Additionally, this work emphasizes potential issues with stacking films to measure depth dose curves, particularly for electron beams with energies 10 MeV.