Optimizing Toxic Chemical Removal through Defect‐Induced UiO‐66‐NH 2 Metal–Organic Framework-Reference-Cited by-同舟云学术

Optimizing Toxic Chemical Removal through Defect‐Induced UiO‐66‐NH 2 Metal–Organic Framework

Published:2017-10-24 Issue:63 Volume:23 Page:15913-15916
ISSN:0947-6539
Container-title:Chemistry – A European Journal
language:en
Short-container-title:Chem. Eur. J.

Author:

Peterson Gregory W.¹^ORCID,Destefano Matthew R.²^ORCID,Garibay Sergio J.²,Ploskonka Ann³,McEntee Monica¹,Hall Morgan¹,Karwacki Christopher J.¹,Hupp Joseph T.²,Farha Omar K.²

Affiliation:

1. Edgewood Chemical Biological Center 5183 Blackhawk Rd. Aberdeen Proving Ground MD 21010 USA

2. Department of Chemistry and the International Institute for Nanotechnology Northwestern University 2145 Sheridan Road Evanston IL 60208 USA

3. Leidos, Inc., PO Box 68 Gunpowder MD 21010 USA

Funder

Defense Threat Reduction Agency

Publisher

Wiley

Subject

General Chemistry,Catalysis,Organic Chemistry

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/chem.201704525

Reference20 articles.

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3. Engineering UiO-66-NH2 for Toxic Gas Removal

4. Removal of chlorine gas by an amine functionalized metal–organic framework via electrophilic aromatic substitution

5. G. W. Peterson J. J. Mahle J. B. DeCoste W. O. Gordon J. A. Rossin Angew. Chem. Int. Ed.2016 Ahead of Print;

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