A Kinetic Model for Step Coverage by Atomic Layer Deposition in Narrow Holes or Trenches-Reference-Cited by-同舟云学术

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A Kinetic Model for Step Coverage by Atomic Layer Deposition in Narrow Holes or Trenches

Published:2003-03-17 Issue:2 Volume:9 Page:73-78
ISSN:0948-1907
Container-title:Chemical Vapor Deposition
language:
Short-container-title:Chem. Vap. Deposition

Author:

Gordon R.G.,Hausmann D.,Kim E.,Shepard J.

Publisher

Wiley

Subject

Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry

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